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calculation assumes that the HS-DSCH is continuously transmitted from all cells, which is pessimistic for low-tra c scenarios. Own-cell interference is estimated from received CPICH power and BTS power using HSDPA: Ptot;HSDPA Own-cell interference Ior RSCP 10 log10 7:7 PCPICH Other-cell interference can be obtained when the other interference components are known: 7:8 Other-cell interference Ioc I0 Ior N0 where N0 is the terminal receiver thermal noise level. The received energy per chip for the HS-DSCH can be obtained as follows: PHS-DSCH HS-DSCH Ec RSCP 10 log10 7:9 PCPICH Finally, we calculate the HS-DSCH SINR using the signal and interference values above: HS-DSCH Ec HS-DSCH SINR dB 10 log10 16 7:10 1 Ior Ioc N0 where is the orthogonality of own-cell interference. Average orthogonality was assumed to be 0.6 in this case study, which corresponds to a typical urban macrocellular environment. If advanced terminal receivers with equalizers are deployed (see Section 7.8.1), orthogonality would be higher. The distribution of the measured CPICH Ec =N0 from the drive tests is shown in Figure 7.20. The median Ec =N0 is 6.1 dB and the 90% value is 9.6 dB.

This memorandum of lease agreement made this ninth day of July 2005, is for the purpose of recording and giving notice of a lease agreement made between David D. Jones, known hereinafter as the Lessor, and Donald S. Reed, known hereinafter as the Lessee, in which Lessor agrees to lease to Lessee that certain real property known as 45735 Hillsborough Avenue, Tampa, Florida 33603, and legally described as: Lots 47, 48 and 49 of Carter s subdivision according to map or plat thereof as recorded in plat book 69, page 89, of the public records of Hillsborough County, Florida, which was executed between the Lessor and Lessee on the ninth day of July 2005 and which will expire at twelve o clock midnight on the eighth day of July 2006. IN WITNESS WHEREOF, Lessor and Lessee have set their hands the date aforesaid David D. Jones Lessor Donald S. Reed Lessee

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Extensive irrigation upstream, however, along with livestock grazing and timber harvests on adjacent uplands, took their toll, and by 1925 only about 18,220 ha were irrigated (Burkholder, 1928 cited in Crawford et al 1993) This reduction was caused by many factors, including increasingly shallow groundwater levels (resulting in seepage and waterlogging), increasing soil salinity, a decreasing supply of water for irrigation, droughts alternating with oods, and an aggrading riverbed due to heavy sediment loads from the overgrazed and deforested watershed combined with an often decreased river ow (Crawford et al, 1993; Crawford et al, 1996a; Wozniak, 1996) Hydrological imbalances and decreased agricultural productivity required technological intervention By the early 1900s, increasing numbers of water management facilities designed to support irrigated agriculture and oodplain development were constructed along the Rio Grande in southern Colorado and New Mexico These included Elephant Butte Dam.

The contours of constant Q for the transmission line 2 are shown in Fig. 1.11.3. This gure shows that, at frequencies satisfying f ( f1 and f ( f2 , the mode of propagation is the slow-wave mode because, in this region, the magnetic eld freely penetrates the substrate while the electric eld does not. When f2 < f < f1 , both transverse electric and magnetic elds freely penetrate the semiconductor substrate and the dielectric quasi-TEM is the mode of propagation. On the other hand, when f1 < f < f2 , neither eld penetrates the substrate and the mode of propagation is the skin effect mode. Using worstcase parameters for the four transmissions lines studied in this section, we can determine that f1 120 GHz and f2 12; 000 GHz. Therefore, all four lines satisfy the criteria for the slow-wave mode propagation and for validity of the quasi-TEM analysis.

The CMOS and other circuits consist of both active and passive devices. Active devices are the transistors while passive devices are the interconnection structures that connect the transistors and gates in the circuit. These interconnections are mostly made of a metal such as aluminum and copper. In addition to its resistance, each interconnection has capacitances to the substrate and to the neighboring

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